The Symposium on Processes & Materials for Nanoelectronics within the framework of EUROMAT Conference (https://euromat2019.fems.eu/) will be held from 1-5 September 2019 in Stockholm, Sweden.
The abstract submission deadline is on 31 January 2019. Abstract submission site: https://euromat2019.fems.eu/abstracts-submission/
The aim is to create a forum for discussion of disruptive technologies and of more traditional ones. Along these lines the topics will include, but will not be limited, to the following:
- Channel semiconductor materials: strained-Silicon, (strained-)Ge, SiGe alloys, GaN, III-V, 2-D materials
- Materials for non-volatile memory devices: PCM, Oxides
- Ferroelectrics and insulating materials
- Magnetic materials for MTJ and related devices
- Emerging novel processes: growth, fabrication, doping, stress
- Advanced characterization techniques: composition, defects, dopants, stress
- Materials and processing related to architecture: planar (Silicon-On-Insulator) vs 3D (multi-gate, nanowires)
- Gate-stack materials for future switching devices
- Resistive RAM materials and devices
- Materials, processing, and characterization for TFET, SET, SAT
- Physical modelling of processes and devices
The Symposium Organizers:
Dimitris Tsoukalas (National Technical University of Athens)
Alain Claverie (CEMES/CNRS, Toulouse)
Marco Fanciulli (University of Milano - Bicocca)
Mikael Östling (KTH Stockholm)
For more information please visit: https://euromat2019.fems.eu/wp-content/uploads/sites/27/2018/10/C11-20181014.pdf
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